The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 30, 2008
Filed:
Jul. 28, 2004
Applicants:
Kazuhiro Hattori, Tokyo, JP;
Mitsuru Takai, Tokyo, JP;
Shuichi Okawa, Tokyo, JP;
Inventors:
Assignee:
TDK Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F 1/00 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
Abstract
A manufacturing method of a magnetic recording medium, and the like are provided, which can suppress misalignment of a processed shape of divided recording elements and magnetic degradation and can efficiently manufacture a magnetic recording medium having good magnetic characteristics. In the manufacturing method, ion beam etching is used as a dry etching technique for a continuous recording layer. Before dry etching of the continuous recording layer, a resist layeris removed. As the material for a first mask layer covering the continuous recording layer, diamond like carbon is used.