The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 30, 2008
Filed:
Apr. 09, 2007
Eri Noguchi, Yokohama, JP;
Yoshitomo Marumoto, Yokohama, JP;
Eri Noguchi, Yokohama, JP;
Yoshitomo Marumoto, Yokohama, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
Beading caused by interferences between block patterns, which are driving patterns of two nozzle arrays at the time of printing with the use of the two nozzle arrays for the same color, and a mask is reduced. Specifically, when the mask is created, repulsive potentials are calculated between the mask and planes with the block patterns. That is, when a placement of a print permitting area in the mask is determined, the repulsive potentials are calculated between the mask and dots in the planes with the block patterns, and then the print permitting area is placed on the most dispersive position with the lowest energy. This allows the print permitting areas to be well dispersed in terms of the overlaps between the block patterns and the mask.