The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 30, 2008

Filed:

Aug. 01, 2005
Applicants:

Yunxiao Gao, Sunnyvale, CA (US);

Hung-chin Guthrie, Saratoga, CA (US);

Ming Jiang, San Jose, CA (US);

Sue Siyang Zhang, Saratoga, CA (US);

Inventors:

Yunxiao Gao, Sunnyvale, CA (US);

Hung-Chin Guthrie, Saratoga, CA (US);

Ming Jiang, San Jose, CA (US);

Sue Siyang Zhang, Saratoga, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/127 (2006.01); H04R 31/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A perpendicular write head includes a main pole comprising a Durimide/Alumina hard mask formed over a laminate layer process to form the main pole without using a liftoff or chemical mechanical polishing process, thereby avoiding rounding corners of the pole, the main pole being controlled in shape for improved control of critical dimension of track width and angle of the bevel to avoid undesirable adjacent track writing.


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