The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 23, 2008
Filed:
Dec. 01, 2004
Edward R. Dowski, Jr., Lafayette, CO (US);
Gregory E. Johnson, Boulder, CO (US);
Kenneth S. Kubala, Boulder, CO (US);
Kenneth Ashley Macon, Longmont, CO (US);
Goran M. Rauker, Longmont, CO (US);
Edward R. Dowski, Jr., Lafayette, CO (US);
Gregory E. Johnson, Boulder, CO (US);
Kenneth S. Kubala, Boulder, CO (US);
Kenneth Ashley Macon, Longmont, CO (US);
Goran M. Rauker, Longmont, CO (US);
OmniVision CDM Optics, Inc., Boulder, CO (US);
Abstract
A system, method and software product to optimize optical and/or digital system designs. An optical model of the optical system design is generated. A digital model of the digital system design is generated. Simulated output of the optical and digital models is analyzed to produce a score. The score is processed to determine whether the simulated output achieves one or more goals. One or more properties of at least one of the optical model and the digital model is modified if the goals are not achieved. The analyzing, processing and modifying is repeated until the goals are achieved, and an optimized optical system design and optimized digital system design are generated from the optical and digital models.