The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 23, 2008

Filed:

Mar. 29, 2006
Applicants:

Takuya Tsukamoto, Himeji, JP;

Noriko Nishiaki, Himeji, JP;

Yoshihiro Horikawa, Himeji, JP;

Senga Takehito, Himeji, JP;

Inventors:

Takuya Tsukamoto, Himeji, JP;

Noriko Nishiaki, Himeji, JP;

Yoshihiro Horikawa, Himeji, JP;

Senga Takehito, Himeji, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J 9/00 (2006.01); H01J 9/42 (2006.01); H01J 61/12 (2006.01); H01J 61/16 (2006.01);
U.S. Cl.
CPC ...
Abstract

Process for producing a discharge lamp having a silica discharge vessel with an emission space in which there is a pair of electrodes at least 0.15 mg/mmof mercury, argon (Ar), and halogen by measuring the relation b/a1 between the emission intensity aof argon (Ar) at a wavelength of 668 nm and the emission intensity b of OH radicals at a wavelength of 309 nm in a state of glow discharge of the discharge lamp; supplying hydrogen into the discharge vessel of the discharge lamp; measuring the relation c/abetween the emission intensity aof argon (Ar) at a wavelength of 668 nm and the emission intensity c of OH radicals at a wavelength of 309 nm in the state of glow discharge of the discharge lamp; and fixing the difference c/a−b/aat a value in the range of 0.001 to 15.


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