The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 23, 2008
Filed:
Jul. 06, 2004
Paul Heremans, Leuven, BE;
Dimitri Janssen, Sint-Niklaas, BE;
Sören Steudel, Dresden, DE;
Stijn Verlaak, Landen, BE;
Paul Heremans, Leuven, BE;
Dimitri Janssen, Sint-Niklaas, BE;
Sören Steudel, Dresden, DE;
Stijn Verlaak, Landen, BE;
Interuniversitair Microelektronica Centrum (IMEC), Leuven, BE;
Abstract
The present invention relates to methods for producing a patterned thin film on a substrate. The method comprises the spatially and possibly also temporally modulation of nucleation modes of film growth during the growth of patterned thin films. The nucleation modes are modulated between no or substantially no nucleation, 2D nucleation, and 3D nucleation. The modulation is obtained by adjusting the surface treatment spatially applied over regions of the substrate, the growth conditions for the thin film materials used, and/or the specific thin film materials used. The growth conditions typically comprise the substrate temperature and the deposition flux. The modulation allows for spatially varying the interaction between the substrate material and the thin film materials deposited.