The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 2008
Filed:
Apr. 20, 2007
Dan Xu, Springfield, IL (US);
Kevin F. King, Menomonee Falls, WI (US);
Zhi-pei Liang, Champaign, IL (US);
Dan Xu, Springfield, IL (US);
Kevin F. King, Menomonee Falls, WI (US);
Zhi-Pei Liang, Champaign, IL (US);
General Electric Company, Schenectady, NY (US);
The Board of Trustees of the University of Illinois, Urbana, IL (US);
Abstract
A system and method are provided for designing RF pulses for multi-channel and/or multi-dimensional spatially-selective applications using a linear approximation. Embodiments of the system and method may use a generalized linear-class large tip angle approximation to design RF pulses for multi-channel and parallel transmission. Further, some of these approximations allow for the design of arbitrarily large flip angles, irregularly-shaped flip angle profiles, or arbitrary initial magnetization values. Embodiments of the system and method may also provide for the design of k-space trajectories which aid in maintaining assumptions of the various linear class approximations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile