The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 2008
Filed:
Dec. 23, 2004
Applicants:
Jin-hong Park, Seoul, KR;
Seong-woon Choi, Suwon-si, KR;
Inventors:
Jin-hong Park, Seoul, KR;
Seong-woon Choi, Suwon-si, KR;
Assignee:
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A photomask and a method of controlling a transmittance and phase of light using the photomask are disclosed. The photomask comprises a transparent substrate, and a plurality of lattices formed on the back face of the transparent substrate. The plurality of lattices are binary lattices, each having a duty ratio and a tilt angle. The duty ratio and tilt angle are controlled together in order to simultaneously control transmittance and phase of light transmitted through the photomask.