The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2008
Filed:
Nov. 27, 2006
Taro Tezuka, Utsunomiya, JP;
Taro Tezuka, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A measurement method for measuring a wavefront aberration of a target optical system using an interference pattern formed by a light from a first image side slit, and a light from a second image side slit, the first and second image side slits being located at an image side of the target optical system, the first image side slit having, in a shorter direction, a width equal to or smaller than a diffraction limit of the target optical system, and the second image side slit having, in a shorter direction, a width greater than the diffraction limit of the target optical system includes the steps of obtaining three or more primary wavefronts of the target optical system from different measurement directions, and calculating a wavefront aberration of the target optical system based on the three or more primary wavefronts obtained by the obtaining step.