The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2008
Filed:
Jan. 14, 2005
Jun Fujinawa, Kanagawa, JP;
Junji Nakada, Shizuoka, JP;
Norio Shibata, Kanagawa, JP;
Takashi Kataoka, Kanagawa, JP;
Jun Fujinawa, Kanagawa, JP;
Junji Nakada, Shizuoka, JP;
Norio Shibata, Kanagawa, JP;
Takashi Kataoka, Kanagawa, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
A pattern film forming method includes a step of producing a transfer sheet in which a thin film is formed on a surface of a sheet-shaped material and a step of pressing the thin film against a pattern film formation surface of the substrate with a pressing member having convex portions corresponding to the pattern film from a reverse surface of the transfer sheet opposite to the thin film or a reverse surface of the substrate opposite to the pattern film formation surface to transfer the thin film to the substrate. A pattern film forming apparatus includes a sheet supply device, a pressing device and a substrate transport device. A high-definition pattern film having a desired pattern and a sharp edge can be formed with high productivity.