The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2008
Filed:
Oct. 30, 2003
Klaus Poellmann, Burghausen, DE;
Martin Glos, Muehldorf, DE;
Anton Strasser, Altoetting, DE;
Eckart Kraemer, Wiesbaden, DE;
Klaus Poellmann, Burghausen, DE;
Martin Glos, Muehldorf, DE;
Anton Strasser, Altoetting, DE;
Eckart Kraemer, Wiesbaden, DE;
Lariant Produkte (Deutschland) GmbH, Sulzbach, DE;
Abstract
The invention relates to copolymers of formula (I) wherein Ris hydrogen, a C-C-alkyl radical or C-C-alkenyl radical which can also contain heteroatoms, an acid group or an aliphatic or aromatic group comprising 1-50 carbon atoms, including an acid group, Rand Rindependently represent hydrogen, methyl and/or ethyl, n ranges from 0-100, and m ranges from 3 to 30, and k ranges from 1-200, and A is hydrogen, an acid group, a C-C-alkyl radical or a C-C-alkenyl radical which can also contain heteroatoms, an aliphatic or aromatic group comprising 1-50 carbon atoms, including an acid group, or a copolymer unit of formula (II), wherein Ris hydrogen, a C-C-alkyl radical or a C-C-alkenyl radical which can also contain heteroatoms, an acid group or an aliphatic or aromatic group comprising 1-50 carbon atoms, including an acid group, Ris hydrogen, methyl and/or ethyl, x ranges from 0 to 100, and y ranges from 3-30, wherein, if A is formula (2), Rrepresents hydrogen or an acid group.