The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2008
Filed:
Nov. 16, 2006
Masato Fujita, Kanagawa, JP;
Kensuke Taniguchi, Kanagawa, JP;
Akira Mitsuiki, Kanagawa, JP;
NEC Electronics Corporation, Kanagawa, JP;
Abstract
In the process of forming a predetermined pattern in a process target film, a stacked hard mask film having a first film, a second film and a third film stacked in this order is formed on the process target film (S), fine line patterns are formed in the third film through a fine-pattern-forming resist film while using the second film as an etching stopper (S), and the fine-pattern-forming resist film is removed (S). Subsequently, light exposure is carried out using a resist film (Sto S), and the second film, the first film and the process target film are then selectively dry-etched in a sequential manner, to thereby form the process target film into a predetermined pattern (S). The first film remained on the process target film is then removed (S).