The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 09, 2008

Filed:

Nov. 21, 2002
Applicants:

Koji Utsugi, Tokyo, JP;

Hironori Yamamoto, Tokyo, JP;

Mariko Miyachi, Tokyo, JP;

Tamaki Miura, Tokyo, JP;

Mitsuhiro Mori, Tokyo, JP;

Yutaka Bannai, Tokyo, JP;

Ikiko Yamazaki, Tokyo, JP;

Inventors:

Koji Utsugi, Tokyo, JP;

Hironori Yamamoto, Tokyo, JP;

Mariko Miyachi, Tokyo, JP;

Tamaki Miura, Tokyo, JP;

Mitsuhiro Mori, Tokyo, JP;

Yutaka Bannai, Tokyo, JP;

Ikiko Yamazaki, Tokyo, JP;

Assignee:

NEC Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/54 (2006.01);
U.S. Cl.
CPC ...
Abstract

A vacuum deposition apparatus is used for deposit evaporated substance from evaporation sources (and) on the desired position of a flexible substrate (). While the flexible substrate () is carried using rollers in a vacuum, shutters (and) are opened and closed to control the movement of the evaporated substance via openings. A film having a desired shape of pattern is formed on the flexible substrate () with higher controllability.


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