The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 09, 2008

Filed:

Aug. 18, 2005
Applicants:

Hien-minh Huu Le, San Jose, CA (US);

Michael T. Starr, San Jose, CA (US);

Inventors:

Hien-Minh Huu Le, San Jose, CA (US);

Michael T. Starr, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05D 23/12 (2006.01); F25D 23/12 (2006.01); C23C 16/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method and apparatus for regulating the temperature of substrates positioned within a chamber are provided. In one embodiment, a substrate support pin is provided that includes a body having a substrate support region defined at a first end and a mounting region defined at a second end of the body. A mounting feature is formed at the mounting region and is adapted to couple the body to a vacuum chamber body. A passage extends from the mounting region to the support region. An outlet formed through the body and orientated at an angle greater than zero relative to a centerline of the body is p provided to deliver fluids flowing through the passage out the first end of the body. In another embodiment, a chamber includes a pin configured to provide a temperature controlled fluid to an underside of a substrate supported on the pin.


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