The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 02, 2008

Filed:

Sep. 30, 2003
Applicants:

Haiyang Wang, Legal Representative, White Plains, NY (US);

Jen-yao Chung, Yorktown Heights, NY (US);

David Cohn, Dobbs Ferry, NY (US);

Fenno F. Heath, Iii, Woodbridge, CT (US);

Jun-jang Jeng, Armonk, NY (US);

Santhosh Kumaran, Croton On Hudson, NY (US);

Hui Lei, Scarsdale, NY (US);

Prabir Nandi, Bayside, NY (US);

Inventors:

Haiyang Wang, legal representative, White Plains, NY (US);

Jen-Yao Chung, Yorktown Heights, NY (US);

David Cohn, Dobbs Ferry, NY (US);

Fenno F. Heath, III, Woodbridge, CT (US);

Jun-Jang Jeng, Armonk, NY (US);

Santhosh Kumaran, Croton On Hudson, NY (US);

Hui Lei, Scarsdale, NY (US);

Prabir Nandi, Bayside, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06Q 10/00 (2006.01); G06Q 30/00 (2006.01); G06Q 50/00 (2006.01); G06F 17/50 (2006.01); G06F 9/44 (2006.01); G06F 9/46 (2006.01); G06F 15/16 (2006.01); G06F 15/173 (2006.01); G05B 19/418 (2006.01);
U.S. Cl.
CPC ...
Abstract

An enterprise system includes a plurality of artifacts (e.g., persons, objects, databases, autonomous elements, intelligent agents, information systems, etc), and a smart distance (e.g., a distance which may optimize the performance of the enterprise system) between the plurality of artifacts.


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