The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 02, 2008

Filed:

Jul. 28, 2004
Applicants:

Pablo Benitez, Madrid, ES;

Juan Carlos Minano, Madrid, ES;

Jose Blen Flores, Madrid, ES;

Maikel Hernandez, Madrid, ES;

Ruben Mohedano Arroyo, Madrid, ES;

Julio Cesar Chaves, Madrid, ES;

Inventors:

Pablo Benitez, Madrid, ES;

Juan Carlos Minano, Madrid, ES;

Jose Blen Flores, Madrid, ES;

Maikel Hernandez, Madrid, ES;

Ruben Mohedano Arroyo, Madrid, ES;

Julio Cesar Chaves, Madrid, ES;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 7/60 (2006.01); G06G 7/48 (2006.01);
U.S. Cl.
CPC ...
Abstract

The embodiments provide methods for use in designing and/or manufacturing optical systems. Some embodiments further provide for the optical systems generated utilizing the methods for use in designing and/or manufacturing. In some embodiments, a method simultaneously generates first and second sets of span points defining first and second surfaces, respectively, where sets of span points are interdependent. The method curve fits through the first and second sets of span points defining initial first and second spines, smoothes the curve fittings such that tangent vectors are perpendicular to normal vectors, and defines patches of the first and second surfaces relative to the first and second spines. Some embodiments simultaneously generate the first and second sets of span points by alternatively determining the points of the sets based on propagation of input wavefronts and associated output wavefronts relative to previously determined points.


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