The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2008
Filed:
Jan. 24, 2006
Masaki Inoue, Himeji, JP;
Hironobu Yabuta, Himeji, JP;
Taku Sumitomo, Himeji, JP;
Kyohei Seki, Himeji, JP;
Masaki Yoshioka, Himeji, JP;
Masaki Inoue, Himeji, JP;
Hironobu Yabuta, Himeji, JP;
Taku Sumitomo, Himeji, JP;
Kyohei Seki, Himeji, JP;
Masaki Yoshioka, Himeji, JP;
Ushiodenki Kabushiki Kaisha, Tokyo, JP;
Abstract
To suppress the adherence of debris as a result of a radiating fuel, such as tin or the like, within a vessel for forming high density and high temperature plasma of an extreme UV radiation source device, and to eliminate deposited tin and/or tin compounds with high efficiency, hydrogen radical producing parts are provided in the vessel; and hydrogen radicals are produced in the vessel so that deposition of tin and/or a tin compound is suppressed in the area with a low temperature of the device, such as a focusing mirror or the like, and the deposited tin and/or tin compound is eliminated.