The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2008
Filed:
Aug. 27, 2003
Yosuke Inomata, Yokaichi, JP;
Yuko Fukawa, Yokaichi, JP;
Yosuke Inomata, Yokaichi, JP;
Yuko Fukawa, Yokaichi, JP;
Kyocera Corporation, Kyoto, JP;
Abstract
A dry etching apparatus that performs etching on a substrateplaced on a trayinside a chamberby covering the substratewith a plateprovided with opening portionsin which a distance D between the surface opposing the substrateand the substratein the peripheral portion of the plateis set shorter than the distance D between the surface opposing the substrateand the substratein the central portion of the plate. Textures can be thus formed homogeneously on the surface of the substrate.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile