The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2008
Filed:
Oct. 12, 2005
Makoto Shibuta, Kumagaya, JP;
Makoto Shibuta, Kumagaya, JP;
Nikon Corporation, Tokyo, JP;
Abstract
An exposure apparatus which prevents damages due to leaked out liquid from expanding and can maintain exposure accuracy and measuring accuracy. The exposure apparatus includes first and second stages (ST, ST) which can independently move within an XY-plane on an image plane side of a projection optical system (PL); a drive mechanism (SD) which moves the first stage and the second stage together with the stage being close to or in contact with each other; a liquid immersion mechanism () which forms a liquid immersion area on an upper plane of at least one of the stages of the first stage and the second stage; and a detecting device () which detects liquid leaked out from between the first stage and the second stage.