The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 25, 2008

Filed:

Oct. 21, 2006
Applicants:

Seung Soo Hong, Daejeon, KR;

Kwang Hwa Chung, Daejeon, KR;

Yong Hyeon Shin, Daejeon, KR;

Inventors:

Seung Soo Hong, Daejeon, KR;

Kwang Hwa Chung, Daejeon, KR;

Yong Hyeon Shin, Daejeon, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01L 21/30 (2006.01); G01N 27/62 (2006.01);
U.S. Cl.
CPC ...
Abstract

Disclosed herein are an apparatus for and method of measuring the composition and the pressure of the discharged gas from an ion gauge by using a residual gas analyzer. In this regard, there are provided a vacuum containerdivided into a pressure containerand a discharge containerby means of a partitionhaving an orificeformed thereon; an ion gaugemounted at the pressure containerside of the vacuum containerfor discharging the gas at the time of vacuum formation; a residual gas analyzermounted at the pressure containerside of the vacuum containerfor measuring the composition and the pressure of the residual gas; pump means disposed at one side of the discharge containerof the vacuum containerfor discharging the inside gas; and heating means disposed at the vacuum containerfor heating the vacuum containerto a predetermined temperature.


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