The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2008
Filed:
Apr. 19, 2005
Applicants:
Ming-ann Hsu, Taoyuan, TW;
Kuang-lung Kuo, Taoyuan, TW;
Mu-lin Tsai, Taoyuan, TW;
Sing-ru Dai, Taoyuan, TW;
Inventors:
Ming-Ann Hsu, Taoyuan, TW;
Kuang-Lung Kuo, Taoyuan, TW;
Mu-Lin Tsai, Taoyuan, TW;
Sing-Ru Dai, Taoyuan, TW;
Assignee:
Echem Solutions Corp., , TW;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C11D 7/50 (2006.01);
U.S. Cl.
CPC ...
Abstract
A photo resist stripper composition includes PGME or its derivatives and ANONE or its derivatives characterized by low toxicity, safe use, free of odors, environment friendly, easy disposal of waste liquid and wastewater; good solution to photo resist material film, proper volatility, excellent stripping capability, good compatibility among different types of photo resist; allowing storage at ambient temperature, low production cost, and not requiring retrofit of the existing equipment.