The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2008
Filed:
Nov. 13, 2003
Shinji Omori, Kanagawa, JP;
Shigeru Moriya, Kanagawa, JP;
Shinichiro Nohdo, Kanagawa, JP;
Sony Corporation, Tokyo, JP;
Abstract
To provide an exposure apparatus and an exposure method able to correct an image-placement error during an exposure which is unable to decrease only by correcting electron beam description data of a mask pattern, and a semiconductor device manufacturing method used the same, wherein an image placement Rof a mask is measured at an inversion posture against an exposure posture (ST), the measured image placement Ris corrected with considering a pattern displacement caused by gravity at the exposure posture and a first correction data Δis prepared based on a difference of the corrected image placement and a designed data (ST), and an exposure is performed by deflecting charged particle beam to correct a position of a pattern to be exposed to a subject based on the first correction data Δ(ST).