The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2008
Filed:
Aug. 22, 2005
Applicants:
Yuanqiao Rao, Pittsford, NY (US);
Samuel Chen, Penfield, NY (US);
Charles W. Lander, Wayland, NY (US);
Tomohiro Ishikawa, Rochester, NY (US);
Theodore R. Vandam, Rochester, NY (US);
Inventors:
YuanQiao Rao, Pittsford, NY (US);
Samuel Chen, Penfield, NY (US);
Charles W. Lander, Wayland, NY (US);
Tomohiro Ishikawa, Rochester, NY (US);
Theodore R. Vandam, Rochester, NY (US);
Assignee:
Eastman Kodak Company, Rochester, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D 3/04 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of fabricating a nanocomposite material includes generating nanoparticles in-situ with a polymer. A nanocomposite material includes a polymer having nanoparticles characterized by a dimension of not more than 50 nm.