The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 25, 2008

Filed:

Feb. 15, 2005
Applicants:

Glen C. Larsen, Issaquah, WA (US);

Krishna Darbha, Bothell, WA (US);

Michael W. Baseflug, Duvall, WA (US);

Inventors:

Glen C. Larsen, Issaquah, WA (US);

Krishna Darbha, Bothell, WA (US);

Michael W. Baseflug, Duvall, WA (US);

Assignee:

Microsoft Corporation, Redmond, WA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 7/16 (2006.01); G01F 25/00 (2006.01); G01L 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Force measuring systems for electronic pens, styli, or other products may include structure for changing a direction or location of application of a force (e.g., a force transmitted via pen or stylus contact with a writing surface) from a first direction or location to a second direction or location. In this manner, a sensor portion of the force measuring system may be reoriented in a direction such that it is not normal to the direction of the force. This feature may help make electronic pens or styli (or other products) thinner and dimensioned more consistent with their non-electronic counterparts. Various structures for changing the direction or location of application of the force are described.


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