The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 18, 2008
Filed:
Jul. 06, 2007
Seok Kyun Song, Seoul, KR;
Seok Kyun Song, Seoul, KR;
UION Co., Ltd., Seoul, KR;
Abstract
The present invention relates, in general, to an induction concentration remote atmospheric pressure plasma generating apparatus, and more particularly, to an induction concentration remote atmospheric pressure plasma generating apparatus in which induction electrodes, discharge electrodes and a ground electrode are used, so that a plasma can be generated in a plasma cell including several metal discharge electrodes by using one power supply device while not generating arc between the metal electrodes, and a high-density plasma is generated at local regions due to a discharge between the metal electrodes and is thus spouted to the surface of a sample by means of the pressure of a working gas. Thus, a plasma is not generated in unnecessary regions.