The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 18, 2008

Filed:

Mar. 09, 2006
Applicants:

Michael Glück, Freiburg, DE;

Christoph Hofstetter, Teningen, DE;

Gerd Hintz, Pfaffenweiler, DE;

Inventors:

Michael Glück, Freiburg, DE;

Christoph Hofstetter, Teningen, DE;

Gerd Hintz, Pfaffenweiler, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F 1/00 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
Abstract

A vacuum plasma generator is used for treating workpieces in a vacuum chamber. The vacuum plasma generator includes a mains connection for connection to a voltage supply network, and at least one mains rectifier. The at least one mains rectifier is connected to at least one first converter that generates at least one intermediate circuit voltage, a first RF signal generator, a second RF signal generator, and at least one 3 dB coupler. The first RF signal generator is connected to at least one intermediate circuit voltage, for generating a first signal of a basic frequency and of a first phase position. The second RF signal generator is connected to at least one intermediate circuit voltage, for generating a second signal of the basic frequency and of a second phase position. The least one 3 dB coupler couples the first and the second signal into an output signal of the generator.


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