The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2008
Filed:
Aug. 13, 2004
Chunye Xu, Seattle, WA (US);
LU Liu, Seattle, WA (US);
Minoru Taya, Mercer Island, WA (US);
University of Washington, Seattle, WA (US);
Abstract
Electropolymerization of EC monomers is employed to obtain an EC polymer film deposited on a substrate. A first embodiment of a method to produce the film employs cyclic voltammetry alone, while a second embodiment deposits a very thin homogeneous layer using chronoamperometry, and then cyclic voltammetry is employed to increase the density of the film. Another aspect of the present invention is directed to specific web like configurations for a grid of conductive material deposited onto a transparent substrate. The web like configuration is based either on concentric circles, or on concentric ellipses. Yet another aspect of the present invention is directed to an imaging system including a digital window that is disposed between a prism and a patterned analytic layer.