The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2008
Filed:
Nov. 09, 2005
Ketao Liu, Cerritos, CA (US);
Peter J. Sedivec, Manhattan Beach, CA (US);
Douglas Bender, Redondo Beach, CA (US);
Gregory S. Becker, Redondo Beach, CA (US);
John Y. Liu, San Marino, CA (US);
Richard W. Guthrie, Moorpark, CA (US);
Mark A. Lundgren, Fullerton, CA (US);
Ketao Liu, Cerritos, CA (US);
Peter J. Sedivec, Manhattan Beach, CA (US);
Douglas Bender, Redondo Beach, CA (US);
Gregory S. Becker, Redondo Beach, CA (US);
John Y. Liu, San Marino, CA (US);
Richard W. Guthrie, Moorpark, CA (US);
Mark A. Lundgren, Fullerton, CA (US);
The Boeing Company, Chicago, IL (US);
Abstract
Systems and techniques for laser metrology. A system may include a laser source and a fanning apparatus configured to generate a fanned laser beam. The fanned laser beam may be scanned across the surface of an object, and may reflect off a plurality of targets positioned on the surface. A position detection module may determine a position of the metrology targets based on the reflected beam.