The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2008
Filed:
Aug. 26, 2004
Applicants:
Yi Zheng, San Ramon, CA (US);
Howard Zolla, San Jose, CA (US);
Nian-xiang Sun, Sunnyvale, CA (US);
Hamid Balamane, Palo Alto, CA (US);
Inventors:
Yi Zheng, San Ramon, CA (US);
Howard Zolla, San Jose, CA (US);
Nian-Xiang Sun, Sunnyvale, CA (US);
Hamid Balamane, Palo Alto, CA (US);
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/544 (2006.01);
U.S. Cl.
CPC ...
Abstract
Methods and systems of enhancing stepper alignment signals and metrology alignment target signals. In one embodiment, a plurality of alternating rows comprising a first material of a first height and a second material of a second height are constructed. The first material and the second material are selected to enhance the contrast of the mark when imaged for alignment of photolithographic structures.