The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2008
Filed:
Apr. 13, 2005
Je-min Park, Gyeonggi-do, KR;
Je-Min Park, Gyeonggi-do, KR;
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Abstract
A semiconductor substrate has a cell region and a peripheral circuit region surrounding the cell region. In the cell region a plurality of lower electrodes are connected to a conductive region of the semiconductor substrate, and are arrayed along row and column directions. A dielectric layer is formed on the plurality of lower electrodes. An upper electrode is formed on the dielectric layer, entirely covering the cell region, and is formed extending to a portion of the peripheral circuit region that has a step coverage lower by a height of the lower electrode than the cell region. An edge of the upper electrode has square-shaped projections that are distanced from each other at a uniform interval and are repetitively arrayed. With the described structure, pattern defects can be sensed and controlled, preventing and substantially reducing process defect.