The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2008
Filed:
May. 02, 2005
Applicant:
Aaron Lewis, Jerusalem, IL;
Inventor:
Aaron Lewis, Jerusalem, IL;
Assignee:
Nanoptics, Inc., Jerusalem, IL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for deconvolving far-field optical images beyond the diffraction limit includes the use of near-field optical and other scanned probe imaging data to provide powerful and new constraints for the deconvolution of far-field data sets. Near-field data, such as that which can be obtained from atomic force microscopy on a region of the far-field data set in an integrated and inter-digitate way, is used to produce resolutions beyond the diffraction limit of the lens that is being used. In the case of non-linear optical imaging or other microscopies, resolutions beyond that which is achievable with these microscopies can be obtained.