The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2008
Filed:
Mar. 15, 2005
Joseph Plewa, Park Ridge, IL (US);
Evan Tanner, Chicago, IL (US);
Daniel Mueth, Chicago, IL (US);
Lewis Gruber, Chicago, IL (US);
Kenneth Bradley, Hinsdale, IL (US);
Joseph Plewa, Park Ridge, IL (US);
Evan Tanner, Chicago, IL (US);
Daniel Mueth, Chicago, IL (US);
Lewis Gruber, Chicago, IL (US);
Kenneth Bradley, Hinsdale, IL (US);
Arryx, Inc., Chicago, IL (US);
Abstract
A method and apparatus for manipulating particles (micro, nano, and pico) having one or more characteristics with an optical trap formed by modulating a laser beam with a Diffractive Optical Element (DOE). At least one characteristic of the material is selected; and a laser beam having a selected wavelength corresponding to the at least one selected characteristic of the material is generated. Values of the DOE are calculated corresponding to the at least one selected characteristic of the material. The beam and the DOE are modulated to produce a holographic optical trap having properties corresponding to the at least one selected characteristic; the trap is focused to a beam focus or selected spot size; and the beam focus is located near a particle location for trapping the particle therein.