The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2008
Filed:
Apr. 30, 2004
Arthur Buechel, Ruggell, LI;
Werner Wieland, Malans, CH;
Christoph Ellert, Feldkirch, AT;
Laurent Sansonnens, Concise, CH;
Arthur Buechel, Ruggell, LI;
Werner Wieland, Malans, CH;
Christoph Ellert, Feldkirch, AT;
Laurent Sansonnens, Concise, CH;
OC Oerlikon Blazers Ag, Balzers, LI;
Abstract
A method for producing a disk shaped workpiece with a dielectric substrate includes treatment in a plasma process volume between two electrode faces bounding a high-frequency plasma discharge. One electrode face is of dielectric material and is at a high-frequency potential with a varying distribution along the face. The other electrode face is metallic. Reactive gas is introduced into the process volume through an aperture pattern. The dielectric substrate, before treatment, is at least regionally coated with a layer material to whose specific resistanceapplies: 10Ωcm≦≦10Ωcm, and to the resulting surface resistance Rof the layer applies: 0<R≦10Ω. Subsequently, the coated substrate is positioned on the metallic electrode face and is etched or coated reactively under plasma enhancement in the plasma process volume.