The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 11, 2008

Filed:

May. 14, 2003
Applicants:

Astrid Heinzmann, Gera, DE;

Eberhard Hennig, Stadtroda, DE;

Daniel Kopsch, Grosstreben-Zwethau, DE;

Patrick Pertsch, Hermsdorf, DE;

Stefan Richter, Hirschberg, DE;

Eike Wehrsdorfer, Eisenberg, DE;

Inventors:

Astrid Heinzmann, Gera, DE;

Eberhard Hennig, Stadtroda, DE;

Daniel Kopsch, Grosstreben-Zwethau, DE;

Patrick Pertsch, Hermsdorf, DE;

Stefan Richter, Hirschberg, DE;

Eike Wehrsdorfer, Eisenberg, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 41/24 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention relates to a method for the production of a monolithic multilayer actuator, a corresponding monolithic multilayer actuator, as well as an external contact for a monolithic multilayer actuator. According to the invention specific microdisturbances are incorporated in the actuator structure along the longitudinal axis of the stack essentially parallel and spaced to the inner electrodes in the area of the at least two opposite outer surfaces to which the inner electrodes known per se are brought out, which at the earliest during polarisation of the actuator are subject to a pregiven, limited, stress-reducing growth into the interior and/or towards the outer electrode, wherein additionally the basic metallic coating and/or the external contact is formed elongation-resistant or elastic at least in the area of the microdisturbances.


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