The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2008
Filed:
Mar. 19, 2003
Hiroto Nishida, Ichihara, JP;
Kenta Tsubohara, Tokyo, JP;
Etsurou Okamoto, Ichihara, JP;
Yoshiaki Deguchi, Ichihara, JP;
Hiroto Nishida, Ichihara, JP;
Kenta Tsubohara, Tokyo, JP;
Etsurou Okamoto, Ichihara, JP;
Yoshiaki Deguchi, Ichihara, JP;
Mitsui Chemicals, Inc., Tokyo, JP;
Abstract
The invention provides a method of reusing an inert gas in a polymer production plant by removing impurities such as a polymerization solvent and polymerization monomers from an inert gas discharged from a polymer production plant. The method of reusing an inert gas comprises a step of adsorbing and removing a polymerization solvent and polymerization monomers contained in an inert gas by passing, through an adsorbent layer, an inert gas discharged from a polymer production plant, wherein an inert gas reaching a predetermined purity by removing the polymerization solvent and polymerization monomers in the step of adsorption and removal is reused in the polymer production plant.