The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2008
Filed:
Sep. 12, 2003
Tsuyoshi Asai, Chigasaki, JP;
Takuya Miyagi, Chigasaki, JP;
Tsuyoshi Asai, Chigasaki, JP;
Takuya Miyagi, Chigasaki, JP;
Toho Titanium Co., Ltd., Chigasaki-shi, JP;
Abstract
An object of the present invention is to provide a method for production of metallic powder in which aggregation of particles and growth to secondary particle after reducing process of the metallic powder particle can be prevented, to reliably obtain metallic particles containing few coarse particles and to meet requirements of thinner layer and greater number of layers in recent capacitors, and a production device therefor. The present invention includes a reducing process in which metal chloride gas and reducing gas are contacted to continuously reduce the metal chloride, and a cooling process in which a gas containing metallic powder generated in the reducing process is continuously cooled by inert gas. In the cooling process, a vortex flow is generated by blowing out the inert gas from at least one part around the flowing passage of the metallic powder. Furthermore, during the production of the metallic powder, inert gas flow is generated in the vertical direction along the inner wall of the production device (reducing process and cooling process) continuously. Aggregation of the metallic powder and growth of secondary particles can be reduced to reliably obtain metallic powder having uniform particle size containing few coarse particles.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile