The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2008
Filed:
Mar. 19, 2004
James Harrison, Kanata, CA;
James Harrison, Kanata, CA;
AstenJohnson, Inc., Charleston, SC (US);
Abstract
An industrial fabric is described which comprises a woven fabric body having opposing ends. The fabric repeating weave pattern includes at least two systems of vertically stacked machine direction warp yarns interwoven with at least one system of cross machine direction weft yarns. On each end of the fabric at least some of the warp yarns form a first set of loops each of which is at a first angle to the machine direction, at least some of the warp yarns form a second set of loops each of which is at a second angle to the machine direction and each of the second set of loops is substantially concentric with the first set of angled loops to provide double end loops which can be seamed by using a coil seam or a pin seam. This fabric structure has the advantage that it is possible to use all of the fabric warp yarns in the loops, thus significantly increasing the tensile strength of the seam. It also permits the fabrication of a flatter seam. This seam design is of particular use in dryer fabrics for a paper making machine.