The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2008
Filed:
Oct. 19, 2006
Andrew G Kirk, Outremont, CA;
Eric Bisaillon, Montreal, CA;
Andrew G Kirk, Outremont, CA;
Eric Bisaillon, Montreal, CA;
McGill University, Montreal, Quebec, CA;
Abstract
An integrated etched multilayer grating-based wavelength multiplexer/demultiplexer is disclosed wherein an etched multilayer grating structure is monolithically integrated within the optical waveguide stack of the multiplexer/demultiplexer to reflectively diffract an input optical beam. The multilayer grating structure is generally comprised of a series of etched diffractive elements and an etched multilayer reflector, the combined optical response of which providing the desired multiplexing/demultiplexing effect. The etched structures are generally comprised of shallow etch structures in a top surface of the multiplexer/demultiplexer waveguide stack. Monolithically integrated input and output ridge waveguides may also be provided, optionally fabricated in a same etching step as the etched multilayer grating.