The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2008
Filed:
May. 28, 2004
Mikel John Stanich, Longmont, CO (US);
Gerhard Robert Thompson, Wappingers Falls, NY (US);
Charles P. Tresser, Brooklyn, NY (US);
Chai Wah Wu, Poughquag, NY (US);
Mikel John Stanich, Longmont, CO (US);
Gerhard Robert Thompson, Wappingers Falls, NY (US);
Charles P. Tresser, Brooklyn, NY (US);
Chai Wah Wu, Poughquag, NY (US);
Infoprint Solutions Company, LLC, Boulder, CO (US);
Abstract
Techniques for generating dither masks are provided. A dither mask is generated by selecting a sequence of at least three original patterns comprising pixels of at least one of a first color and a second color. At least two patterns are interpolated to generate interpolated patterns in the sequence between the at least three original patterns. If a pattern having at least one specified characteristic exists in the sequence, the steps of interpolating between at least two patterns, and determining if a pattern having at least one specified characteristic exists in the sequence, are repeated. The interpolation is between at least one pattern from each side of the pattern having at least one specified characteristic in the sequence.