The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7446864 B1

PDF
Full Text
Expired
Date of Patent:
Nov. 04, 2008

Filed:

Apr. 06, 2006
Applicants:

Hiroshi Okabe, Kyoto, JP;

Toshihiko Matsumoto, Kyoto, JP;

Inventors:

Hiroshi Okabe, Kyoto, JP;

Toshihiko Matsumoto, Kyoto, JP;

Assignee:

Omron Corporation, Kyoto-Shi, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A surface of a work to be inspected is irradiated with an illumination unit for a coaxial incident illumination and an illumination unit for an oblique incident illumination driven to take its image by a camera at the same time. Each of the illumination units and comprises light sources emitting color lights R, G and B, respectively. One of the three kinds of light sources is lighted in the illumination unit and one or two of the light sources which are not lighted in the illumination unit are lighted in the illumination unit.


Find Patent Forward Citations

Okabe, Hiroshi. (2008). Defect inspection method and defect inspection system using the method (U.S. Patent No. 7446864). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7446864

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