The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2008
Filed:
Sep. 18, 2006
Jonathan W. Campbell, Madison, AL (US);
David L. Lehner, Huntsville, AL (US);
Larry L. Smalley, Huntsville, AL (US);
Molly C. Smith, Legal Representative, Madison, AL (US);
Alvin J. Sanders, Knoxville, TN (US);
Dennis Duncan Earl, Knoxville, TN (US);
Stephen W. Allison, Knoxville, TN (US);
Jonathan W. Campbell, Madison, AL (US);
David L. Lehner, Huntsville, AL (US);
Larry L. Smalley, Huntsville, AL (US);
Molly C. Smith, legal representative, Madison, AL (US);
Alvin J. Sanders, Knoxville, TN (US);
Dennis Duncan Earl, Knoxville, TN (US);
Stephen W. Allison, Knoxville, TN (US);
Abstract
A method and system for determining range to a target are provided. A beam of electromagnetic energy is transmitted through an aperture in an opaque screen such that a portion of the beam passes through the aperture to generate a region of diffraction that varies as a function of distance from the aperture. An imaging system is focused on a target plane in the region of diffraction with the generated image being compared to known diffraction patterns. Each known diffraction pattern has a unique value associated therewith that is indicative of a distance from the aperture. A match between the generated image and at least one of the known diffraction patterns is indicative of a distance between the aperture and target plane.