The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 04, 2008

Filed:

Jan. 30, 2006
Applicants:

Sung-wook Hwang, Seoul, KR;

Chul-ho Shin, Yongin-si, KR;

Inventors:

Sung-Wook Hwang, Seoul, KR;

Chul-Ho Shin, Yongin-si, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01S 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Example embodiments of the present invention provide a reflector for generating a neutral beam and a substrate processing apparatus including the same. The reflector may include at least one reflecting plate including a reflecting layer onto which an ion beam collides and a supporting layer. The reflecting layer may reflect and convert the ion beam into a neutral beam, and the supporting layer may reduce thermal deformation of the reflecting layer.


Find Patent Forward Citations

Hwang, Sung-Wook. (2008). Reflector for generating a neutral beam and substrate processing apparatus including the same (U.S. Patent No. 7446325). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7446325

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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