The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2008
Filed:
Jul. 29, 2005
Victor LU, Santa Cruz, CA (US);
Lei Jin, San Jose, CA (US);
Arlene J. Suedmeyer, San Jose, CA (US);
Paul G. Apen, San Jose, CA (US);
Peter Alfred Smith, Long Valley, NJ (US);
Jinghong Chen, Santa Clara, CA (US);
Victor Lu, Santa Cruz, CA (US);
Lei Jin, San Jose, CA (US);
Arlene J. Suedmeyer, San Jose, CA (US);
Paul G. Apen, San Jose, CA (US);
Peter Alfred Smith, Long Valley, NJ (US);
JingHong Chen, Santa Clara, CA (US);
Honeywell International Inc., Morristown, NJ (US);
Abstract
The invention relates to low temperature curable spin-on glass materials which are useful for electronic applications, such as optical devices. A substantially crack-free and substantially void-free silicon polymer film is produced by (a) preparing a composition comprising at least one silicon containing pre-polymer, a catalyst, and optionally water; (b) coating a substrate with the composition to form a film on the substrate, (c) crosslinking the composition by heating to produce a substantially crack-free and substantially void-free silicon polymer film, having a a transparency to light in the range of about 400 nm to about 800 nm of about 95% or more.