The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2008
Filed:
Feb. 27, 2007
Applicants:
Koji Asakawa, Tokyo, JP;
Kenichi Ohashi, Kawasaki, JP;
Akira Fujimoto, Kawasaki, JP;
Takashi Sasaki, Yokohama, JP;
Inventors:
Koji Asakawa, Tokyo, JP;
Kenichi Ohashi, Kawasaki, JP;
Akira Fujimoto, Kawasaki, JP;
Takashi Sasaki, Yokohama, JP;
Assignee:
Kabushiki Kaisha Toshiba, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03C 1/00 (2006.01); G03C 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Disclosed is an acid etching resistance material comprising a compound having a repeating unit represented by the following general formula (1):
Asakawa, Koji. (2008). Method of manufacturing semiconductor device, acid etching resistant material and copolymer (U.S. Patent No. 7445881). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7445881
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile