The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2008
Filed:
Apr. 05, 2006
Applicant:
Cheng Tsien Chou, Oxford, GB;
Inventor:
Cheng Tsien Chou, Oxford, GB;
Assignee:
Oxford Instruments Analytical Limited, Oxford, GB;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 23/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method is provided for correcting magnetic field distortions in an electron backscatter diffraction (EBSD) pattern. An EBSD pattern is firstly generated from a sample placed within an electron microscope. A predetermined representation of a magnetic field in the microscope is used to calculate the trajectories of electrons in the microscope, for different emergence angles. A corrected EBSD pattern is then calculated using the calculated trajectories, the corrected EBSD pattern representing the EBSD pattern if the microscope magnetic field were substantially absent.