The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2008
Filed:
Feb. 22, 2005
Ikuo Matsukura, Kanagawa, JP;
Hidekazu Okamoto, Kanagawa, JP;
Eisuke Murotani, Kanagawa, JP;
Kazuya Oharu, Kanagawa, JP;
Ikuo Matsukura, Kanagawa, JP;
Hidekazu Okamoto, Kanagawa, JP;
Eisuke Murotani, Kanagawa, JP;
Kazuya Oharu, Kanagawa, JP;
Asahi Glass Company, Limited, Tokyo, JP;
Abstract
A pellicle which is excellent in transmittance and durability against short wavelength light, and which can be used for photolithography by using e.g. a KrF excimer laser, is provided. A pellicle for exposure to a light having a wavelength of at most 200 nm, which comprises a frame and a pellicle membrane bonded to the frame by means of an adhesive, wherein the pellicle membrane and/or the adhesive comprises a polymer containing repeating units represented by the following formula (1): wherein Q represents a Cpolyfluoroalkylene group having a linear structure, or a group having at least one atom selected from hydrogen atoms and fluorine atoms in such a polyfluoroalkylene group substituted by a substituent comprising a polyfluoroalkyl group which may contain an ethereal oxygen atom, or the like, and X represents a hydrogen atom, a fluorine atom or a Cpolyfluoroalkyl group which may contain an ethereal oxygen atom.