The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2008
Filed:
Feb. 08, 2006
Applicants:
Yoon-sik Lee, Anyang-si, KR;
Sun-jong Ryoo, Seoul, KR;
Tae-kyung Lee, Seoul, KR;
Inventors:
Assignee:
BeadTech Inc., Seoul, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08G 63/48 (2006.01); C08G 69/26 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention relates to an aminomethyl polystyrene resin wherein aminomethyl group is grafted only on the surface of polystyrene resin, and a preparation process for the same. More particularly, the present invention is directed to a process for preparing aminomethyl polystyrene resin wherein aminomethyl group is grafted only on the surface of polystyrene resin, which comprises a step for grafting amidomethyl group to surface of polystyrene resin and a step for hydrolysis of the amidomethyl group grafted on the surface of polystyrene resin.