The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7442728 B1

PDF
Full Text
Expired
Date of Patent:
Oct. 28, 2008

Filed:

Nov. 13, 2005
Applicants:

Jiang-jen Lin, Taichung, TW;

Chien-chia Chu, Taichung, TW;

Inventors:

Jiang-Jen Lin, Taichung, TW;

Chien-Chia Chu, Taichung, TW;

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08K 9/06 (2006.01); C08K 3/34 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention relates to an exfoliating agent and to a process for producing random form of nanoscale silicate plates. The exfoliating agent applied in the present invention has the formula: wherein n=1 to 5 and R is a polyoxypropylene group, poly(oxyethylene/oxypropylene) group, polyoxybutylene group, or polyoxyethylene group. In this invention, layered silicate clays are exfoliated into random silicate plates by acidifying AMO with inorganic acid, adding the acidified AMO to layered silicate clay with agitation, and adding sodium hydroxide or chloride of alkali metal or alkaline-earth metal, in ethanol, water and a hydrophobic organic solvent to the intermediate product and repeating phase separation procedures to isolate random silicate plates from water phase.


Find Patent Forward Citations

Lin, Jiang-Jen. (2008). Method for producing nanosilicate plates (U.S. Patent No. 7442728). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7442728

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