The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2008
Filed:
Jul. 01, 2004
Mark A. Strobel, Maplewood, MN (US);
Seth M. Kirk, Minneapolis, MN (US);
Joel A. Getschel, Osceola, WI (US);
Matthew J. Skaruppa, Chicago, IL (US);
Mark A. Strobel, Maplewood, MN (US);
Seth M. Kirk, Minneapolis, MN (US);
Joel A. Getschel, Osceola, WI (US);
Matthew J. Skaruppa, Chicago, IL (US);
3M Innovative Properties Company, St. Paul, MN (US);
Abstract
Methods and systems utilize an atmospheric-pressure nitrogen dielectric-barrier discharge to treat the surface of polymer substances. The atmospheric-pressure nitrogen dielectric-discharge may be maintained with a level of HO below a pre-defined amount, such as by measuring and controlling the HO within a treater, to produce a surface treatment for a polymer substance that yields desirable characteristics. Furthermore, the HO level may be measured and controlled according to a pre-defined amount or according to another parameter such as an analysis of the resulting polymer surface. For example, the polymer surface may be provided with an optimal added nitrogen-to-added oxygen ratio and/or an optimal stability based on washed and unwashed advancing contact angles such as by controlling the HO level within the treater based on these analyses of the treated polymer.