The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2008
Filed:
May. 26, 2004
Masahiko Miyamoto, Kanagawa-ken, JP;
Mitsutoshi Hasegawa, Kanagawa-ken, JP;
Kazuhiro Sando, Kanagawa-ken, JP;
Kazuya Shigeoka, Tokyo, JP;
Masahiko Miyamoto, Kanagawa-ken, JP;
Mitsutoshi Hasegawa, Kanagawa-ken, JP;
Kazuhiro Sando, Kanagawa-ken, JP;
Kazuya Shigeoka, Tokyo, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A novel process for producing an electron source substrate is disclosed for formation of electron-emitting element at high efficiency with less shape irregularity. In the process, the region for electroconductive film formation is divided into plural subregions on which an electroconductive film is formed respectively. In forming the electroconductive film by application of plural liquids, the time interval between the application of the two drops is controlled to be larger than the time length necessary for suppressing the spreading of the succeedingly applied liquid within an allowable limit.